JPH021228B2 - - Google Patents

Info

Publication number
JPH021228B2
JPH021228B2 JP56013836A JP1383681A JPH021228B2 JP H021228 B2 JPH021228 B2 JP H021228B2 JP 56013836 A JP56013836 A JP 56013836A JP 1383681 A JP1383681 A JP 1383681A JP H021228 B2 JPH021228 B2 JP H021228B2
Authority
JP
Japan
Prior art keywords
workpiece
positive electrode
frame body
mounting frame
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56013836A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57131363A (en
Inventor
Mitsugi Enomoto
Masao Koshi
Shotaro Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP1383681A priority Critical patent/JPS57131363A/ja
Publication of JPS57131363A publication Critical patent/JPS57131363A/ja
Publication of JPH021228B2 publication Critical patent/JPH021228B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP1383681A 1981-02-03 1981-02-03 Ion plating device Granted JPS57131363A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1383681A JPS57131363A (en) 1981-02-03 1981-02-03 Ion plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1383681A JPS57131363A (en) 1981-02-03 1981-02-03 Ion plating device

Publications (2)

Publication Number Publication Date
JPS57131363A JPS57131363A (en) 1982-08-14
JPH021228B2 true JPH021228B2 (en]) 1990-01-10

Family

ID=11844355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1383681A Granted JPS57131363A (en) 1981-02-03 1981-02-03 Ion plating device

Country Status (1)

Country Link
JP (1) JPS57131363A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1264025A (en) * 1987-05-29 1989-12-27 James A.E. Bell Apparatus and process for coloring objects by plasma coating
JP3192642B2 (ja) * 1998-10-02 2001-07-30 住友特殊金属株式会社 表面処理用支持部材、表面処理用ホルダー、並びに表面処理方法
CN105986229B (zh) * 2016-06-27 2018-09-07 广东腾胜真空技术工程有限公司 一种均匀性的多弧离子镀膜设备

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55145336A (en) * 1979-05-01 1980-11-12 Yoichi Murayama High frequency ion-plating device

Also Published As

Publication number Publication date
JPS57131363A (en) 1982-08-14

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